The Plasma Etching of Polysilicon with CF 3Cl / Argon Discharges: III . Modeling of Etching Rate and Directionality
- 1 November 1986
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 133 (11) , 2331-2338
- https://doi.org/10.1149/1.2108402
Abstract
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