High rate deposition of alumina films by reactive gas flow sputtering
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 59 (1-3) , 171-176
- https://doi.org/10.1016/0257-8972(93)90078-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Zirconia thin film deposition on silicon by reactive gas flow sputtering: the influence of low energy particle bombardmentMaterials Science and Engineering: A, 1991
- Hollow cathode discharge sputtering device for uniform large area thin film depositionJournal of Vacuum Science & Technology A, 1991
- High-rate low kinetic energy gas-flow-sputtering systemJournal of Vacuum Science & Technology A, 1989
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986