Selective Metallization of Mg/NH3-Treated Teflon by Copper CVD

• 5 August 1999
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 5  (4) , 185-190
• https://doi.org/10.1002/(sici)1521-3862(199908)5:4<185::aid-cvde185>3.0.co;2-i

Abstract

Keywords

• SOLVATED ELECTRONS
• TEFLON
• LOW-K MATERIALS
• METALLIZATION
• COPPER CVD FILMS