Techniques and characterization of pulsed electromigration at the wafer-level

• 1 November 1992
• journal article
• Published by Elsevier in Microelectronics Reliability
• Vol. 32  (11) , 1527-1532
• https://doi.org/10.1016/0026-2714(92)90451-p

Abstract

Keywords

• PULSED ELECTROMIGRATION
• WAFER LEVEL
• TECHNIQUES AND CHARACTERIZATION
• CHARACTERIZATION OF PULSED