Heavily Boron Doped Crystalline Silicon Films by Plasma Technique
- 1 July 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (7R) , 1222
- https://doi.org/10.1143/jjap.22.1222
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- The electrical properties of polycrystalline silicon filmsJournal of Applied Physics, 1975
- Structures of Si Films Chemically Vapor-Deposited on Amorphous SiO2SubstratesJapanese Journal of Applied Physics, 1975
- Microstructural Analysis of Evaporated and Pyrolytic Silicon Thin FilmsJournal of the Electrochemical Society, 1973
- Growth and Characterization of Polycrystalline SiliconJournal of the Electrochemical Society, 1973