Infrared Spectroscopic Study of GeOx Films
- 1 October 1987
- journal article
- research article
- Published by Wiley in Physica Status Solidi (b)
- Vol. 143 (2) , K147-K150
- https://doi.org/10.1002/pssb.2221430253
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Differences between the bonding of oxygen in glow discharge deposited a-Si:H and a-Ge:HJournal of Non-Crystalline Solids, 1984
- Amorphe und glasartige anorganische FestkörperPublished by Walter de Gruyter GmbH ,1983
- Infrared Studies of Reactively Sputtered SiOx Films in the Composition Range 0.2 ≦ x ≦ 1.9Physica Status Solidi (b), 1982
- Chemical bond and related properties of SiO2. VII. Structure and electronic properties of the SiOx region of Si–SiO2 interfacesPhysica Status Solidi (a), 1980
- The Vibrational Properties of Disordered Systems: Numerical StudiesReviews of Modern Physics, 1972