Mechanical properties of SiOx thin films
- 1 March 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 89 (2) , 175-190
- https://doi.org/10.1016/0040-6090(82)90446-1
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Effect of heat treatment on chemical and electronic structure of solid SiO : An electron spectroscopy studySolid State Communications, 1977
- X-ray K absorption spectra of silicon in Si, SiO and SiO2Chemical Physics Letters, 1974
- Recent developments in the study of mechanical properties of thin filmsThin Solid Films, 1972
- Analysis of evaporated silicon oxide films by means of (d, p) nuclear reactions and infrared spectrophotometryPhysica Status Solidi (a), 1971
- Analyse stœchiométrique de couches évaporées d'oxyde de silicium par observation simultanée des réactions nucléaires (d, p) sur l'oxygène et le siliciumRevue de Physique Appliquée, 1971
- ESR Centers in Silicon MonoxideJapanese Journal of Applied Physics, 1970
- Microanalysis of the stable isotopes of oxygen by means of nuclear reactionsAnalytical Chemistry, 1967
- Dielectric Properties of Films Formed by Vacuum Evaporation of Silicon MonoxideJournal of Applied Physics, 1967
- Infrarotspektroskopische Untersuchungen zur Struktur getemperter Siliciumoxid-AufdampfschichtenZeitschrift für Naturforschung A, 1964
- Zur Kenntnis der SiO- und Si 2 O 3 -Phase in Dünnen SchichtenOptica Acta: International Journal of Optics, 1962