Improved high moment FeAlN/SiO/sub 2/ laminated materials for thin film recording heads
- 1 November 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 27 (6) , 4879-4881
- https://doi.org/10.1109/20.278977
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Nitrogen-doped iron-film-based laminated materials for thin-film recording headsJournal of Applied Physics, 1991
- rf-diode-sputtered iron nitride films for thin-film recording head materialsJournal of Applied Physics, 1990
- Magnetics and microstructure of sputtered Ni/sub 80/Fe/sub 20//SiO/sub 2/ multilayer filmsIEEE Transactions on Magnetics, 1990
- Soft magnetic Fe-Al-N/Si-N multilayered film with high thermal stabilityApplied Physics Letters, 1989
- Synthesis of iron-nitride films by means of ion beam depositionIEEE Transactions on Magnetics, 1984