Intelligent design splitting in the stencil mask technology used for electron- and ion-beam lithography
- 1 November 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (6) , 2400-2403
- https://doi.org/10.1116/1.586994
Abstract
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