In situ study of the hydrogen rich overlayer at the a-Si:H surface by infrared ellipsometry
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 771-774
- https://doi.org/10.1016/s0022-3093(05)80234-0
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- I n s i t u investigation of the growth of rf glow-discharge deposited amorphous germanium and silicon filmsJournal of Applied Physics, 1987