Optical Properties of Plasma-Deposited Silicon-Oxygen Alloy Films
- 1 April 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (4R)
- https://doi.org/10.1143/jjap.29.636
Abstract
Hydrogenated amorphous silicon-oxygen alloy films are prepared by r.f. glow discharge decomposition of a SiH4–CO2 gas mixture. The optical properties of these films are discussed in terms of oxygen content. The Lorentz-Lorenz theory is the best approximation to the dependence of the refractive index on the oxygen content. The existence of silicon-rich and oxygen-rich phases is probable in the amorphous alloy films.Keywords
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