Chromium-based attenuated embedded shifter preproduction
- 7 December 1994
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 299-304
- https://doi.org/10.1117/12.195825
Abstract
Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.Keywords
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