Automated and calibrated whole wafer etch pit density measurements in GaAs
- 1 March 1989
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 18 (2) , 191-197
- https://doi.org/10.1007/bf02657407
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Symmetrical contours of deep level EL2 in liquid encapsulated Czochralski GaAsApplied Physics Letters, 1983