Soft magnetic properties of Fe-N and Fe-Si-N thin films sputtered in (Ar+N/sub 2/) plasma
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 26 (5) , 1503-1505
- https://doi.org/10.1109/20.104425
Abstract
The soft magnetic properties of sputtered (0 approximately 3-wt%) Si-Fe alloy thin films fabricated in (Ar+N/sub 2/) plasma were investigated in connection with metallurgical structure. 2.7-wt% Si-Fe film annealed at 400 degrees C shows a high effective permeability mu /sub eff/ of about 1600 at 5 MHz. It has been observed that this film consists of alpha -Fe with a grain size of less than 150 AA and a slight expansion of lattice spacing of theKeywords
This publication has 2 references indexed in Scilit:
- Magnetic properties of Fe-Si-N films sputtered in (Ar+N2) plasma.Journal of the Magnetics Society of Japan, 1990
- Single Crystal Anisotropy and Magnetostriction Constants of Several Ferromagnetic Materials Including Alloys of NiFe, SiFe, AlFe, CoNi, and CoFeJournal of Applied Physics, 1959