Aluminium film growth by chemical vapour deposition of AlH3(NMe3)2
- 1 January 1990
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society, Chemical Communications
- No. 1,p. 11-13
- https://doi.org/10.1039/c39900000011
Abstract
The surface thermal decomposition mechanism of bistrimethylamine alane [AlH3(Me3N)2] on the Ga rich (4 × 1) GaAs(100) surface was studied by thermal desorption spectroscopy (TDS), high resolution electron energy loss spectroscopy (HREELS), and XPS and was found to result in the deposition of carbon free aluminium films.Keywords
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