High-resolution EUV imaging tools for resist exposure and aerial image monitoring
- 6 May 2005
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 5751, 78-89
- https://doi.org/10.1117/12.606715
Abstract
Key features are presented of two high-resolution EUV imaging tools: the MS-13 Microstepper wafer exposure and the RIM-13 reticle imaging microscope. The MS-13 has been developed for EUV resist testing and technology evaluation at the 32nm node and beyond, while the RIM-13 is designed for actinic aerial image monitoring of blank and patterned EUV reticles. Details of the design architecture, module layout, major subsystems and performance are presented for both tools.Keywords
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