Nanomechanical resonant structures in silicon nitride: fabrication, operation and dissipation issues
- 29 May 2002
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 101 (1-2) , 215-219
- https://doi.org/10.1016/s0924-4247(02)00149-8
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Correction to "high-Q Hf microelectromechanical filters"IEEE Journal of Solid-State Circuits, 2000
- Mechanical resonant immunospecific biological detectorApplied Physics Letters, 2000
- Energy dissipation in suspended micromechanical resonators at low temperaturesPhysica B: Condensed Matter, 2000
- Quality factors in micron- and submicron-thick cantileversJournal of Microelectromechanical Systems, 2000
- Thermoelastic damping in micro- and nanomechanical systemsPhysical Review B, 2000
- Nanofabrication and electrostatic operation of single-crystal silicon paddle oscillatorsJournal of Applied Physics, 1999
- Measurement of mechanical resonance and losses in nanometer scale silicon wiresApplied Physics Letters, 1999
- A Study of Microcantilever Quality FactorPublished by Transducer Research Foundation Inc. (TRF) ,1998
- Fabrication of nanoelectromechanical systems in single crystal silicon using silicon on insulator substrates and electron beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Magnetic resonance force microscopyReviews of Modern Physics, 1995