Dose-dependent cesium ion beam damage effects on chemically modified poly(methyl methacrylate) films using secondary ion mass spectrometry and x-ray photoelectron spectroscopy
- 1 January 1985
- journal article
- Published by American Chemical Society (ACS) in Analytical Chemistry
- Vol. 57 (1) , 137-142
- https://doi.org/10.1021/ac00279a035
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: