A further comment on "Determining specific contact resistivity from contact end resistance measurements"

1 April 1985

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 6 (4) , 184-185
https://doi.org/10.1109/edl.1985.26090

Abstract

The purpose of this comment is to contribute to a better understanding of the influence of lateral current crowding, sheet resistance, and interface pitting in the determination of the interface contact resistivity in four terminal resistor test patterns, for two different metallization schemes, i.e., 1Al/n⁺Si and (Al + 1.5-percent Si)/n⁺Si.

Keywords

CONDUCTIVITY
ELECTRICAL RESISTANCE MEASUREMENT
CONTACT RESISTANCE
PROXIMITY EFFECT
METALLIZATION
CURRENT MEASUREMENT
TESTING
COMPUTATIONAL MODELING
DATA ANALYSIS
COMPUTER INTERFACES

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