Nucleation and growth of diamond on FeSi2/Si substrates by hot filament chemical vapor deposition
- 15 May 1992
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 71 (10) , 4944-4948
- https://doi.org/10.1063/1.351380
Abstract
We have investigated the characteristics of diamondnucleation on silicon substrates alloyed with iron during hot‐filament chemical vapor deposition of diamondfilm. It is shown that the presence of FeSi2 phase enhances nucleation of diamond crystals by more than an order of magnitude compared to bare silicon substrates. The FeSi2 was formed by laser deposition of iron on silicon substrates, followed by thermal annealing at 700 °C. The deposition characteristics of diamond and reaction of iron with silicon substrates were investigated as a function of annealing treatments using Rutherford backscattering, x‐ray diffraction, Raman and Auger electron spectroscopy, and transmission electron microscopy. Implications of controlling and enhancing the diamondnucleation in the formation of continuous diamondfilm are discussed.This publication has 12 references indexed in Scilit:
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