A study of nickel passivity by nuclear microanalysis of O16 and O18 isotopes
- 29 February 1972
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 17 (2) , 161-170
- https://doi.org/10.1016/0013-4686(72)85017-5
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- The use of the nuclear microanalysis of light elements in electrochemistry applications to anodic oxidation processes by direct determination of 16O and by 18O tracingCollection of Czechoslovak Chemical Communications, 1971
- A Study of the Oxygen Growth Laws of Anodic Oxide Films on Aluminum and Tantalum Using Nuclear Microanalysis of O16 and O18Journal of the Electrochemical Society, 1971
- An O18 Study of the Source of Oxygen in the Anodic Oxidation of Silicon and Tantalum in Some Organic SolventsJournal of the Electrochemical Society, 1971
- The influence of the electrolyte on the composition of ‘anodic oxide films’ on tantalumJournal of Physics and Chemistry of Solids, 1969
- Microanalysis of the stable isotopes of oxygen by means of nuclear reactionsAnalytical Chemistry, 1967
- Radiochemical study of the mechanism of passivation of ironElectrochimica Acta, 1967
- An Ellipsometric Determination of the Mechanism of Passivity of NickelJournal of the Electrochemical Society, 1966
- Kinetics of the Anodic Dissolution of Nickel in Sulfuric Acid SolutionsJournal of the Electrochemical Society, 1964
- Anodic Passivation of Nickel in Sulfuric Acid SolutionsJournal of the Electrochemical Society, 1963