Proposal for an etching mechanism of InP in CH4-H2 mixtures based on plasma diagnostics and surface analysis
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3) , 1552-1559
- https://doi.org/10.1116/1.581186
Abstract
No abstract availableKeywords
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