A simple method of end-point determination for plasma etching
- 1 November 1980
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 17 (6) , 1378-1381
- https://doi.org/10.1116/1.570678
Abstract
It is shown that end-point detection in plasma etching can be accomplished simply and without the use of sophisticated and expensive equipment by using a commercial vacuum gauge to monitor the effluent gas.Keywords
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