The preparation and characterization of transition metal nitride films
- 1 April 1982
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 20 (4) , 966-967
- https://doi.org/10.1116/1.571654
Abstract
Nitride surface films of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W have been prepared by reaction with NH3 gas at high temperature. The films have been characterized by x-ray diffraction, Auger electron spectroscopy, depth profiling, and scanning electron microscopy.Keywords
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