End station design and wafer quality control for a high current oxygen implanter

• 1 January 1987
• journal article
• Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
• Vol. 21  (1) , 324-327
• https://doi.org/10.1016/0168-583x(87)90851-2

Abstract

Keywords

• QUALITY CONTROL
• HIGH CURRENT
• END STATION
• WAFER QUALITY
• OXYGEN IMPLANTER
• CURRENT OXYGEN
• STATION DESIGN