Composition of amorphous (Si,Ge):H films from nuclear elastic scattering of 12 MeV protons
- 15 March 1985
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 46 (6) , 552-554
- https://doi.org/10.1063/1.95535
Abstract
Nuclear elastic scattering of 12 MeV protons was employed for the first time to study the composition of thin films of hydrogenated amorphous Si-Ge alloys. The concentrations of H, Si, and Ge were measured simultaneously. The detection limit is about 25 ppm for a 10-min run. Free-standing films or films on a flat substrate with a total thickness of up to 20 μm can be analyzed.Keywords
This publication has 5 references indexed in Scilit:
- Amorphous Semiconductor SuperlatticesPhysical Review Letters, 1983
- A Comparison of the Thermal Stabilities of Fluorinated and Hydrogenated Amorphous-SiliconsJapanese Journal of Applied Physics, 1980
- New precision technique for measuring the concentration versus depth of hydrogen in solidsApplied Physics Letters, 1976
- Nondestructive Analysis for Trace Amounts of HydrogenJournal of Applied Physics, 1972
- Elastic Scattering of Protons by , , and at 10.9 and 11.7 MeVPhysical Review B, 1964