Systematic optimization of polymeric electro-optic materials

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Abstract
Chromophore-containing polymeric electro-optic materials must satisfy many requirements before they can be considered for use in applications at telecommunication wavelengths (1.3 and 1.55 microns). These include large macroscopic electro-optic activity, low optical loss, and stability (thermal, chemical, and photochemical). Such materials must be capable of being integrated with silica fiber optics and semiconductor electronics. We discuss design of chromophores not only for large hyperpolarizability but also for low optical loss and for thermal and photochemical stability. The processing of these materials to maximize electro-optic activity while minimizing processing- associated optical loss is discussed. Device structures appropriate for minimizing insertion loss are discussed, as is the fabrication of such dvices and three-dimensional active/passive optical circuits. The identification of new structure/function relationships provide design criteria for future improvements as well as permitting better definition of the performance limitations that can be expected for polymeric electro-optic materials prepared by electric field poling methods.

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