A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

• 1 February 2001
• journal article
• research article
• Published by Wiley in Advanced Materials
• Vol. 13  (3) , 195-197
• https://doi.org/10.1002/1521-4095(200102)13:3<195::aid-adma195>3.0.co;2-a

Abstract

Keywords

• MICROLITHOGRAPHY
• RESISTS