Polymers for 157-nm photoresist applications: a progress report
- 23 June 2000
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 365-374
- https://doi.org/10.1117/12.388320
Abstract
Finding materials that offer the all of the characteristics required of photoresist matrix resin polymers while trying to maintain a high level of transparency at 157 nm is a daunting challenge. To simplify this task, we have broken the design of these polymers down into subunits, each of which is responsible for a required function in the final material. In addition, we have begun collecting gas-phase VUV spectra of these potential subunits to measure their individual absorbance contributions. Progress on developing materials for each of these subunits are presented along with plans for future studies.Keywords
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