Deposition of MoS2Films by Physical Sputtering and Their Lubrication Properties in Vacuum
- 1 January 1969
- journal article
- research article
- Published by Taylor & Francis in A S L E Transactions
- Vol. 12 (1) , 36-43
- https://doi.org/10.1080/05698196908972244
Abstract
Physical d-c sputtering of MoS2 was used to apply MoS2 films for as a solid lubricant on rotating and sliding components. This method does not utilize binders or burnishing. Friction experiments in vacuum (10−11 torr) were conducted on these films (approx. 2000 Å thick). The coefficient of friction for these films were similar to the reported values for resin bonded films 0.03–0.08. The long endurance life of these films in friction experiments indicates good adherence. The good adherence results from cleanliness of the surface (etched) and the relatively high energies of the sputtered material on arrival at the surface. These sputtered MoS2 films were consistent in regard to stoichiometry, adherence, thickness, and uniformity when the sputtering conditions were accurately controlled from run to run.Keywords
This publication has 8 references indexed in Scilit:
- Vapor Deposited Gold Thin Films as Lubricants in Vacuum (10−11 mm Hg)Journal of Vacuum Science and Technology, 1966
- Sliding Behavior of Some Layer Lattice Compounds in Ultrahigh VacuumA S L E Transactions, 1966
- On the Mechanisms of MoS2-Film Failure in Sliding FrictionA S L E Transactions, 1965
- Lubrication by Transferred Films of Solid LubricantsA S L E Transactions, 1965
- Impact Evaporation and Thin Film Growth in a Glow DischargePublished by Elsevier ,1963
- Frictional Properties of Some Solid Lubricant Films under High Load.Journal of Chemical & Engineering Data, 1961
- Etching of Refractories and Cermets by Ion BombardmentJournal of the American Ceramic Society, 1958
- Sputtering by Ion BombardmentPublished by Elsevier ,1955