To-and-Fro Motion of W₅Si₃ on a β-Si₃N₄ Substrate at Elevated Temperatures

1 February 2002

journal article
research article
Published by Cambridge University Press (CUP) in Microscopy and Microanalysis

Vol. 8 (1) , 16-20
https://doi.org/10.1017/s1431927602010048

Abstract

Behavior of fine crystalline particles of W₅Si₃ on a β-Si₃N₄ substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W₅Si₃ moved in a to-and-fro manner.

Keywords

FINE PARTICLES
TO-AND-FRO MOTION
IN SITU HEATING EXPERIMENT
W5SI3
Β-SI3N4

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To-and-Fro Motion of W5Si3 on a β-Si3N4 Substrate at Elevated Temperatures

Abstract

Keywords

To-and-Fro Motion of W₅Si₃ on a β-Si₃N₄ Substrate at Elevated Temperatures