Structure and Chemistry of Oxide Films Thermally Grown on Molybdenum Silicides
- 1 November 1965
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 48 (11) , 551-558
- https://doi.org/10.1111/j.1151-2916.1965.tb14671.x
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- High-Temperature OxidationJournal of the Electrochemical Society, 1964
- Effect of an Electric Field on Silicon OxidationThe Journal of Chemical Physics, 1962
- Oxidation of Silicon by High-Pressure SteamJournal of the Electrochemical Society, 1962
- THE DISSOCIATION PRESSURES AND THE HEATS OF FORMATION OF THE MOLYBDENUM SILICIDES1The Journal of Physical Chemistry, 1960
- Kinetics of the Oxidation and Nitridation of Silicon at High TemperaturesThe Journal of Physical Chemistry, 1958
- The High Temperature Oxidation of SiliconThe Journal of Physical Chemistry, 1957
- A SURVEY OF THE FREE ENERGIES OF FORMATION OF THE FLUORIDES, CHLORIDES, AND OXIDES OF THE ELEMENTS TO 2500 KPublished by Office of Scientific and Technical Information (OSTI) ,1953
- The Oxidation of Silicon at High TemperaturesJournal of the American Chemical Society, 1951