Design and Verification of Nearly Ideal Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor
- 1 June 1991
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 138 (6) , 1806-1816
- https://doi.org/10.1149/1.2085878
Abstract
A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one‐dimensional, infinite‐radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated‐disk conditions, and gas temperatures are addressed with both one‐ and two‐dimensional numerical fluid mechanics models. Experimental verification of the design using flow visualization and laser Raman thermometry are presented.Keywords
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