Negative Differential Resistance in Electrochemically Self-Assembled Layered Nanostructures
- 30 December 1998
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 103 (3) , 395-398
- https://doi.org/10.1021/jp983911s
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Potential oscillations during the electrochemical self-assembly of copper/cuprous oxide layered nanostructuresJournal of Materials Research, 1998
- Electrochemical Self-Assembly of Copper/Cuprous Oxide Layered NanostructuresJournal of the American Chemical Society, 1998
- Electrodeposition of quantum‐confined metal/semiconductor nanocompositesAdvanced Materials, 1997
- Hybrid Electrochemical/Chemical Synthesis of Supported, Luminescent Semiconductor Nanocrystallites with Size Selectivity: Copper(I) IodideJournal of the American Chemical Society, 1997
- Quantum saturation and condensation of excitons inO: A theoretical studyPhysical Review B, 1996
- Electrochemical Deposition of Copper(I) Oxide FilmsChemistry of Materials, 1996
- Electrodeposited Defect Chemistry SuperlatticesScience, 1994
- Scanning Tunneling Microscopy of Electrodeposited Ceramic SuperlatticesScience, 1992
- Single-electron transfer in metallic nanostructuresNature, 1992
- Theories of a New Solid Junction RectifierScience, 1926