Reactive ion beam etching of Y-Ba-Cu-O superconductors
- 4 January 1988
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 52 (1) , 69-71
- https://doi.org/10.1063/1.99321
Abstract
It has been found that a reactive ion beam etching (RIBE) using Cl2 gas is useful for microfabrication of Y‐Ba‐Cu‐O superconductors. The etching yield enhancement of Y‐Ba‐Cu‐O is observed for Cl2 RIBE. The etching yield of Y‐Ba‐Cu‐O at 400 V accelerating voltage, 2×10−3 Torr Cl2 pressure for Cl2 RIBE is 2, which is twice that for Ar ion beam etching. Y‐Ba‐Cu‐O submicron patterns have been fabricated by focused ion beam lithography and Cl2 RIBE. Moreover, a Y‐Ba‐Cu‐O superconducting line with a 4‐μm linewidth has been fabricated by annealing an as‐sputtered Y‐Ba‐Cu‐O line pattern.Keywords
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