Molecular plating, V. The influence of some experimental factors on the deposition yield
- 2 January 1967
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 46 (2) , 305-308
- https://doi.org/10.1016/0029-554x(67)90088-2
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Molecular plating: A method for the electrolytic formation of thin inorganic filmsPublished by Elsevier ,2002
- Molecular plating, IV a rapid method for the electrodeposition of plutoniumNuclear Instruments and Methods, 1965
- Molecular plating III the rapid preparation of radioactive reference samplesNuclear Instruments and Methods, 1964
- Molecular plating II a rapid and quantitative method for the electrodeposition of the rare-earth elementsNuclear Instruments and Methods, 1964
- Molecular plating I, a rapid and quantitative method for the electrodeposition of thorium and uraniumNuclear Instruments and Methods, 1964
- Quantitative Electrodeposition of Thorium and UraniumNature, 1963