Colloid formation effects on depth profile of implanted Ag in SiO2 glass
- 11 October 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (15) , 2050-2052
- https://doi.org/10.1063/1.110588
Abstract
Ag+ ions of 150 keV were implanted into SiO2 glasses at room temperature to doses of 0.1–60×1016/cm2. Formation of Ag colloids in SiO2 glasses was observed by the cross‐sectional transmission electron microscopy and optical absorption spectra. An anticorrelation is found between the Ag colloid size and the width of the Ag depth profile measured by Rutherford backscattering spectrometry. At low dose, the size of Ag colloids is small (<10 nm in diameter) and the Ag depth profile is close to that of a simulation calculation. At increasing dose, small Ag colloids and/or Ag atoms aggregate to grow up to ∼40 nm and the width of the Ag depth profile is reduced to ∼50 nm, which is close to the above colloid size, indicating that the size of a Ag colloid particle controls the Ag depth profile. The size and shape of colloids are the keys which modify the optical properties by metallic ion implantation for applications such as optical isolators.Keywords
This publication has 14 references indexed in Scilit:
- Picosecond nonlinear optical response of a Cu:silica nanocluster compositeOptics Letters, 1993
- Anomalous fringe pattern of Ag colloid in phosphate glasses by implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Preparation of Fe nanocrystalline in SiO2 by ion implantationApplied Physics Letters, 1992
- Computational models in atomic collision studiesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992
- Cross-sectional TEM observation of copper-implanted SiO2 glassJournal of Non-Crystalline Solids, 1992
- Slowing-down time of energetic atoms in solidsPhysical Review B, 1989
- Energy dependence of the ion-induced sputtering yields of monatomic solidsAtomic Data and Nuclear Data Tables, 1984
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980
- Aggregation and migration of ion-implanted silver in lithia-alumina-silica glassJournal of Applied Physics, 1977
- The sputtering of oxides part i: a survey of the experimental resultsRadiation Effects, 1973