A new approach to high temperature photoresists based on styrylpyridinium units
- 20 August 1988
- journal article
- Published by Wiley in Journal of Polymer Science Part A: Polymer Chemistry
- Vol. 26 (9) , 2517-2527
- https://doi.org/10.1002/pola.1988.080260921
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Styrylpyridine‐based epoxy resins: Synthesis and characterizationJournal of Polymer Science: Polymer Chemistry Edition, 1984
- Preparation and characteristics of photocross‐linkable poly(vinyl alcohol)Journal of Polymer Science: Polymer Chemistry Edition, 1982
- Photocycloaddition in solid poly(vinyl cinnamate). The photoreactive polymer matrix as an ensemble of chromophore sitesMacromolecules, 1981
- Photocycloaddition at excimer sites in a solid polyester of p-phenylenediacrylic acidMacromolecules, 1981
- Immobilization of enzymes with use of photosensitive polymers having the stilbazolium groupJournal of Polymer Science: Polymer Chemistry Edition, 1980
- Solid-state polymerization mechanismsPublished by Walter de Gruyter GmbH ,1977
- Photoreactive PolymersPublished by Springer Nature ,1974
- CONDENSATION REACTIONS OF 2,6-LUTIDINE AND AN ESTROGENIC 2,6-DISTYRYLPYRIDINE DERIVATIVEThe Journal of Organic Chemistry, 1950