Orientational dependence of the exchange biasing in molecular-beam-epitaxy-grown Ni80Fe20/Fe50Mn50 bilayers (invited)
- 15 May 1994
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (10) , 6659-6664
- https://doi.org/10.1063/1.356888
Abstract
The exchange biasing field (Heb) and coercive field (Hc) of molecular‐beam‐epitaxy‐grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001], and [110] orientations have been investigated by longitudinal Kerr effect measurements. Ni80Fe20 and Fe50Mn50 were deposited as orthogonal wedge‐shaped layers on single‐crystal Cu substrates in a magnetic field, enabling the study of the thickness dependence of Heb and Hc on a single sample for each orientation. A strong dependence of Heb and Hc on the growth orientation is observed. The results are interpreted in terms of the observed noncollinear spin structure of the antiferromagnet and a comparison is given with the predictions from recent theoretical models.This publication has 28 references indexed in Scilit:
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