Mechanical Properties of Poly-methyl methacrylate (PMMA) for Nano Imprint Lithography
- 1 January 2003
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 16 (4) , 615-620
- https://doi.org/10.2494/photopolymer.16.615
Abstract
Mechanical property of a polymer over glass transition temperature is an important factor to design process conditions in nano imprint lithography or nano embossing technology. Mechanical properties such as shear modulus, retardation time and viscosity are experimentally evaluated for poly methyl methacrylate (PMMA) for various molecular weights (12 k to 996 k) over 100°C. Also, dependency on the shearing strain rate is evaluated using WLF law. Based on the results, process conditions are discussed for nano imprint lithography and experimentally demonstrated high aspect ratio pattern.Keywords
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