Aluminum/aluminum-nitride sputter deposition on the inertial fusion target using the pulsed-gas process

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Abstract
Typical inertial confinement fusion targets consist of glass microballoons containing pressurized DT gas. They are often coated with organic and/or metal layers which should have variations of thickness and density of a few percent. Root mean square surface roughness should be less than 500 Å. We have utilized the pulsed nitrogen process during sputter coatings of aluminum onto the glass microballoons. Improvement of surface finish and density is substantial when compared with pure aluminum deposits. X-ray diffraction studies and energy dispersive analysis imply that a small amount of ionized nitrogen atoms are incorporated into growing crystallographic planes of the layer and effectively poison the surface to prevent further growth. Under such conditions, crystallization is limited to small crystallites or amorphous structure forms. The improved surface finish observed is due to the amorphous structure of the film.

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