Lattice Damage, Boron Diffusion, and Dopant Activation in BF 2 Implanted Layers

• 1 November 1987
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 134  (11) , 2905-2911
• https://doi.org/10.1149/1.2100311

Abstract