Effect of the duty ratio of line and space in phase-shifting lithography

• 1 January 1995
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 13  (1) , 137-141
• https://doi.org/10.1116/1.587971

Abstract

Keywords

• PHASE SHIFT