Conduction-band formation in metal layers intercalated in Ta: Nuclear resonance of Sn, Hg, and Pb in Ta
- 15 May 1974
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 9 (10) , 3965-3968
- https://doi.org/10.1103/physrevb.9.3965
Abstract
Metal layers of Sn, Hg, and Pb intercalated into Ta have been studied by nuclear magnetic resonance. The completely intercalated layers in Ta, Ta, and Ta have fully metallic nuclear-resonance frequency shifts with and (parallel and perpendicular to normal to layers) (0.69 ± 0.02)% and (0.81 ± 0.03)% for at 296 °K; (1.66 ± 0.10)% and (2.56 ± 0.10)% for at 4.2 °K; and (1.28 ± 0.10)% and (1.54 ± 0.05)% for at 296 °K. Ta, which has an intercalated structure with one-third-filled Sn layers, yielded for at 296 °K, suggesting a much smaller conduction-electron state density at the Fermi energy than in the fully filled layers. The indirect nuclear-spin interaction through conduction electrons estimated from the measured values and calculated dipolar contribution was also weaker in than in Ta. A decomposition of the susceptibility components of the compounds is made. The Mössbauer-effect splitting previously observed in Ta is shown to be produced by quadrupole effects. Interpretation of the conduction-band formation in terms of a Mott criterion is proposed.
Keywords
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