Conduction-band formation in metal layers intercalated in TaS2: Nuclear resonance of Sn, Hg, and Pb in TaS2

Abstract
Metal layers of Sn, Hg, and Pb intercalated into TaS2 have been studied by nuclear magnetic resonance. The completely intercalated layers in Sn1.0TaS2, Hg1.0TaS2, and Pb1.0TaS2 have fully metallic nuclear-resonance frequency shifts K with K and K (parallel and perpendicular to normal to layers) (0.69 ± 0.02)% and (0.81 ± 0.03)% for Sn119 at 296 °K; (1.66 ± 0.10)% and (2.56 ± 0.10)% for Hg199 at 4.2 °K; and (1.28 ± 0.10)% and (1.54 ± 0.05)% for Pb207 at 296 °K. Sn1/3TaS2, which has an intercalated structure with one-third-filled Sn layers, yielded K=K=+(0.08±0.01)% for Sn119 at 296 °K, suggesting a much smaller conduction-electron state density at the Fermi energy than in the fully filled layers. The Sn119 indirect nuclear-spin interaction through conduction electrons estimated from the measured T2 values and calculated dipolar contribution was also weaker in Sn1/3 TaS2 than in Sn1.0TaS2. A decomposition of the susceptibility components of the compounds is made. The Sn119 Mössbauer-effect splitting previously observed in Sn1.0TaS2 is shown to be produced by quadrupole effects. Interpretation of the conduction-band formation in terms of a Mott criterion is proposed.