SOI wafer flow process for stencil mask fabrication

• 1 May 1999
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 46  (1-4) , 473-476
• https://doi.org/10.1016/s0167-9317(99)00043-x

Abstract

Keywords

• STENCIL MASK
• PROCESS FOR STENCIL
• DOPING
• STRESS
• FABRICATION
• SOI
• FLOW
• WAFER