Resistance associated with FET gate metallization
- 1 August 1980
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 1 (8) , 151-153
- https://doi.org/10.1109/EDL.1980.25269
Abstract
The resistance of the metallization of a FET gate stripe has the effect of placing a non-linear resistance R(I) in series with the gate junction. A simple means of calculating R(I) is developed, and a curve of the drop across R(1) at milliampere forward biases is given.Keywords
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