Electron-beam and photolithographic fabrication of guided-wave optical components
- 1 October 1977
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 48 (10) , 4149-4151
- https://doi.org/10.1063/1.323450
Abstract
Thin‐film lenses, mirrors, and diffraction gratings have been fabricated from electon‐beam‐generated masks. These masks were used to make iron oxide working masks for photolithographic fabrication of these passive components in Nb2O5 optical waveguides. The optical‐waveguide characteristics of these components are discussed.This publication has 8 references indexed in Scilit:
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