Preparation of thin films of copper(I) bromide by r.f. sputtering: morphology and electrical properties
- 1 June 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 323 (1-2) , 31-36
- https://doi.org/10.1016/s0040-6090(97)00900-0
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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