Nanometer molecular lithography
- 10 March 1986
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 48 (10) , 676-678
- https://doi.org/10.1063/1.96741
Abstract
We demonstrate a three-step parallel process for the fabrication of a 1-nm-thick metal (Ta/W) film with 15-nm-diam holes periodically arranged on a triangular lattice of parameter 22 nm. In this process, a two-dimensional crystalline protein monolayer is deposited on a smooth substrate, metal coated by evaporation, and then ion milled. Under ion milling this protein-metal heterostructure exhibits differential metal removal and rearrangement which varies on a protein molecular length scale. The spatial ordering of the resulting holes has the same nanometer periodicity as the protein lattice.Keywords
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