Measurement of Ion Sputtering Yields for In-depth Profiling Analysis
Open Access
- 1 January 1991
- journal article
- Published by Iron and Steel Institute of Japan in Tetsu-to-Hagane
- Vol. 77 (12) , 2171-2178
- https://doi.org/10.2355/tetsutohagane1955.77.12_2171
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
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